Preparation and characterization of time dependent haze on silicon surfaces

Diffusion and Defect Data Pt.B: Solid State Phenomena

Volumn 76-77, Issue , 2000, Pages 115-118

  Munter N ^a   Kolbesen, B O ^a   Storm, W ^b   Muller T ^b  

^a GOETHE UNIVERSITY   (Germany)

^b SILTRONIC AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ADDITIVES; ATOMIC FORCE MICROSCOPY; IMPURITIES; IONS; LIGHT SCATTERING; PLASTICS APPLICATIONS; SIGNAL TO NOISE RATIO; SURFACE STRUCTURE;

IONIC CONTAMINANTS; LOCALIZED LIGHT SCATTERER; PLASTIC BOX; TIME DEPENDENT HAZE; WET CLEANING PROCESS;

SILICON WAFERS;

EID: 0343897822     PISSN: 10120394     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (7)

1. T. Hattori, Ultraclean Surface Processing of Silicon Wafers, Springer-Verlag (1998), p. 3, 4, 179
2. K. J. Budde, W. J. Holzapfel, M. M. Beyer, J. Electrochem. Soc. 142 (1995), p. 888
3. L. Fabry, M. Wieser, R. Berman, Productronica 97 Proceedings, Fraunhofer IRB Verlag, p. 49
4. K. Saga, T. Hattori, J. Electrochem. Soc. 143 (1996), p. 3279
5. M. S. Phadke, Quality engineering using robust design, PTR Prentice-Hall, Inc. (1989), p. 5
6. H. Krotil, O. Marti, Surf. Interface Anal. 27 (1999), p. 336
7. N. Münter, B. Kolbesen, W. Storm, ALTECH 99, ECS PV 99-16 (1999), p. 180