A PE-MOCVD route to V2O5 nanostructured thin films

Journal De Physique. IV : JP

Volumn 9 I, Issue 8, 1999, Pages

  Barreca, D ^a  

^a UNIVERSITY OF PADOVA   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; BOROSILICATE GLASS; ELECTRIC CONDUCTIVITY; MICROSTRUCTURE; MORPHOLOGY; NANOSTRUCTURED MATERIALS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SECONDARY ION MASS SPECTROMETRY; SYNTHESIS (CHEMICAL); THIN FILMS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

HIGH PURITY NANOCRYSTALLINE LAYERS; IMPEDANCE SPECTROSCOPY; VANADIUM PENTOXIDE; VANADYL DIKETONATE;

VANADIUM COMPOUNDS;

EID: 0343826107     PISSN: 11554339     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (23)

1. Granqvist G.G., Handbook of Inorganic Electrochromic Materials (Elsevier Science, Amsterdam 1995).
2. Barreca D., Depero L.E., Franzato E., Rizzi O.A., Sangalctti L., Tondello E., Vettori U., J. Electrochem Soc. 146 (1999) 551.
3. Lourenco A., Gorenstein A., Passerini S., Smyrl W.H., Fantini M.C.A., Tabackniks M.H., J Electrochem. Soc. 145 (1998) 706.
4. Zhang Ji-G., Liu P., Turner J.A., Tracy C.E., Benson D.K., J. Electrochem. Soc. 145 (1998) 1889.
5. Kuypers A.D., Spec C.I.M.A., Linden J.L., Kirchner G., Forsyth J.F, Mackor A., Surface and Coalings Technology 74-75 (1995) 1033.
6. Seibin J., Maus G., Johnson D.L., J. Inorg. Nucl. Client. 24 (1967) 1735.
7. Barreca D., Depero L.E., Di Noto V., Rizzi G.A., Sangaletti L., Tondello E., Chem. Mater. 11 (1999) 255.
8. Swanepoel R., J. Phys. E: Sei. lustrum. 16 (1983) 1214.
9. Inorganic Crystal Structure Database, ICSD, card no. 60767, Karlsruhe (1/1997).
10. Smith L.R., Rohrer O.S., Lee K.S., Seo D.-K., Whangboo M.-H., Surf. Sei. 367 (1996) 87.
11. Millet P., Satto C., Sciau P., Galy J. J. Solid State Chem. 136 (1998) 56.
12. Kobayashi S., Takenura T, Kaneko F., Jpn. J. Appl. Phys. 26 (1987) L1274.
13. Hitchman M.L., Jensen K.F., Chemical Vapor Deposition: Principles and Applications (Academic Press, London, 1993) p. 397.
14. Yu K.N., Xiong Y., Liu Y., Xiong C., Phys. Rev. B 55 (1997) 2666.
15. Shin S., Suga S., Taniguchi M., Fujisawa M., Kanzaki H., Fujimori A., Daimon H., Ueda Y., Kosuge K., Kachi S., Phys. Rev. B 41 (1990) 4993.
16. (a) Özer N., Thin Solid Films 305 (1997) 80 and references therein; (b) Mendialdua J., Casanova R., Barbaux Y., J. Electron Spectrosc. Relat. Phenom. 71 (1995) 249.
17. Khan G.A., Hogarth C.A., J. Mater. Sei. 26 (1991) 597.
18. Sawatzky G.A., Post D., Phys. Rev. B 20 (1979) 1546.
19. Boukamp B.A., Equivalent Circuit (EQUIVCRT.PAS), University of Twente, Dept. of Chemical Technology, PO Box 217, 7500 AE Enschede, Netherlands.
20. Raistrick I.D., Macdonald J.R., Franceschetti D.R., Impedance Spectroscopy (ed. J.R. Macdonald), J. Wiley & Sons, New York, USA (1987).
21. See for instance: Hodge I.M., Ingram M.D., West A.R., J. Electroanal. Chem. 74 (1976) 125.
22. Rao C.N.R., Gopalakrishnan J., New Directions in Solid State Chemistry, Und edition, Cambridge University Press, Cambridge, UK (1997).
23. Barreca D., Battiston O.A., Caccavale F., Di Noto V., Gerbasi R., Gregori A., Rizzi G.A., Tondello E., to be published.