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Volumn 43, Issue 5, 2000, Pages 137-138,-140,-142,-145

Cu contamination control for advanced interconnect manufacturing

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CONTAMINATION; COPPER; METAL CLEANING; METALLIZING; MICROELECTRONICS;

EID: 0343777281     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article
Times cited : (4)

References (9)
  • 2
    • 0342826979 scopus 로고    scopus 로고
    • MRS
    • D.T. Price, R.J. Gutmann, Proc. Advanced Metallization Conference (AMC), Colorado Springs, CO, Oct. 1998 (Conference Proceedings ULSI XIV, MRS 1999), p. 653.
    • (1999) Conference Proceedings ULSI XIV , pp. 653
  • 6
    • 18344414023 scopus 로고    scopus 로고
    • Addressing Cu contamination via spin-etch cleaning
    • Nov.
    • P.S. Lysaght, M. West, "Addressing Cu contamination via spin-etch cleaning," Solid State Technology, p. 63, Nov. 1999.
    • (1999) Solid State Technology , pp. 63
    • Lysaght, P.S.1    West, M.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.