Computer simulation of ion-beam induced crystamization and planar growth of amorphous layers in semiconducters

Izvestiya Akademii Nauk. Ser. Fizicheskaya

Volumn 62, Issue 4, 1998, Pages 867-871

  Titov, A I ^a   Voskoboynikov, S P ^a   Kucheyev, S O ^a  

^a NONE

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EID: 0343685505     PISSN: 03676765     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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