Ellipsometric monitoring of an oriented diamond nucleation process in bias-enhanced chemical vapor deposition

Applied Physics Letters

Volumn 71, Issue 20, 1997, Pages 2913-2915

  Hayashi, Yasuaki ^a   Li, Xi ^a   Nishino, Shigehiro ^a  

^a KYOTO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0343408058     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.120214     Document Type: Article

References (19)

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