Si/Ge-nanocrystals on SiC(0001)

Thin Solid Films

Volumn 380, Issue 1-2, 2000, Pages 86-88

  Hess G ^a   Bauer, A ^a   Krausslich J ^a   Fissel, A ^a   Schroter B ^a   Richter, W ^a   Schell, N ^b   Matz, W ^b   Goetz, K ^a  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

^b INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL LATTICES; FILM GROWTH; NANOSTRUCTURED MATERIALS; SEMICONDUCTING GERMANIUM; SEMICONDUCTING SILICON; SILICON CARBIDE; X RAY CRYSTALLOGRAPHY;

HIGH RESOLUTION X-RAY DIFFRACTION (HRXRD);

SEMICONDUCTING FILMS;

EID: 0343395858     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01535-2     Document Type: Article

References (3)

1. Fissel A., Pfenninghaus K., Richter W. Thin Solid Films. 318:1998;88.
2. Matz W., Schell N., Bernhard G., Prokert F., Reich T., Claußner J., Oehme W., Schlenk R., Dienel S., Funke H., Eichhorn F., Betzl M., Pröhl D., Strauch U., Hüttig G., Krug H., Neumann W., Brendler V., Reichel P., Deneke M.A., Nitsche H. J. Synchrotron Radiat. 6:1999;1076-1085.
3. Warren B.E. X-Ray Diffraction. 1969;41-50 Dover publications, INC, New York.