Interdiffusion in amorphous Nb/Si multilayers

Materials Letters

Volumn 45, Issue 2, 2000, Pages 120-124

  Bochníček, Zdeněk ^a   Vávra, Ivo ^b  

^a MASARYK UNIVERSITY   (Czech Republic)

^b INSTITUTE OF ELECTRICAL ENGINEERING   (Slovakia)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ANNEALING; INTERDIFFUSION (SOLIDS); LIGHT REFLECTION; NIOBIUM; SILICON; SURFACE ROUGHNESS; THERMODYNAMIC STABILITY; TRANSMISSION ELECTRON MICROSCOPY;

X RAY OPTICAL REFLECTION;

MULTILAYERS;

EID: 0343341679     PISSN: 0167577X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-577X(00)00089-6     Document Type: Article

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