High rate deposition of thick epitaxial films by thermal plasma flash evaporation

Pure and Applied Chemistry

Volumn 70, Issue 6, 1998, Pages 1193-1197

  Terashima, Kazuo ^a   Yamaguchi, Norio ^a   Hattori, Tomoyuki ^a   Takamura, Yuzuru ^a   Yoshida, Toyonobu ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0343249771     PISSN: 00334545     EISSN: None     Source Type: Journal    
DOI: 10.1351/pac199870061193     Document Type: Article

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