On the influence of oxygen contamination on the properties of CuAlX2 (X = Se, Te)

Journal of Materials Science

Volumn 36, Issue 1, 2001, Pages 87-92

  Bernede J C ^a   Marsillac, S ^a   Ould El Moctar, C ^a   Ben Chouk, K ^b   Khelil, A ^b  

^a LPSE   (France)

^b UNIVERSITY OF ORAN   (Algeria)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ARGON; CONTAMINATION; CRYSTAL STRUCTURE; DEPOSITION; EVAPORATION; OPTICAL PROPERTIES; OXYGEN; SEMICONDUCTING FILMS; SINGLE CRYSTALS; STOICHIOMETRY; THIN FILMS;

COPPER ALUMINUM SELENIDE; COPPER ALUMINUM TELLURIDE;

COPPER ALLOYS;

EID: 0343026664     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1004894825543     Document Type: Article

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