Dopant activation of heavily doped silicon-on-insulator by high density currents

Journal of Applied Physics

Volumn 86, Issue 3, 1999, Pages 1552-1557

  Chen, Chih ^a   Huang, J S ^a   Liao, C N ^a   Tu, K N ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0342775294     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.370928     Document Type: Article

References (21)

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