Thickness measurements of thin anodic oxides on GaAs using atomic force microscopy, profilometry, and secondary ion mass spectrometry

Applied Physics Letters

Volumn 68, Issue 19, 1996, Pages 2675-2677

  Schmuki, P ^a   Buchanan, M ^a   Mason, B F ^a   Sproule, G I ^a   Graham, M J ^a  

^a NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0342727730     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116278     Document Type: Article

References (7)

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4. R. J. Hussey, T. L. Hoffmann, and M. J. Graham, Electrochem. Soc. Proc. 94-16, 440 (1994).
5. C. W. Wilmsen, Physics and Chemistry of III-V Compound Semiconductor Interfaces (Plenum, New York, 1985).
6. S. Szpak, J. Electrochem. Soc. INS 124, 107 (1977).
7. W. H. Makky, F. Cabrera, K. M. Geib, and C. M. Wilmsen, J. Vac. Technol. AIP 21, 417 (1982).