Novel approach to collimated physical vapor deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 4, 1999, Pages 1941-1945

  Kools, J C S ^a   Paranjpe, A P ^a   Heimanson, D H ^a   Schwartz, P V ^a   Song, K ^a   Berqner, B ^a   McAllister, S ^a   Van Ysseldyk, R W ^b  

^a CVC Products   (United States)

^b Applied Magnetics Corporation   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODIC ARC DEPOSITION; CONTINUOUS COVERAGE; CONVENTIONAL METHODS; HIGH RESOLUTION; HIGH-ASPECT RATIO; HOLLOW CATHODES; ION BEAM DEPOSITION; IONIZED PVD; LIFT-OFF PROCESS; LIFT-OFF TECHNOLOGY; MAGNETORESISTIVE THIN FILMS; METALLIZATION LAYERS; METALLIZATIONS; PHYSICAL VAPOR DEPOSITIONS (PVD); SHADOW MASKING; SUBSTRATE ATOM; SUBSTRATE SURFACE;

ASPECT RATIO; CHEMICAL MODIFICATION; DISTRIBUTION FUNCTIONS; METALLIZING; PHYSICAL VAPOR DEPOSITION;

ANGULAR DISTRIBUTION;

EID: 0342668539     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581707     Document Type: Conference Paper

References (11)

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