A 2.45 GHz ECR ion source for production of medium charge states ions

Review of Scientific Instruments

Volumn 69, Issue 2, 1998, Pages 712-714

  Wutte, D C ^a   Leitner, M A ^a   Williams, M D ^a   Leung, K N ^a   Gough, R A ^a   Saadatmand, K ^b   Benveniste, V ^b  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b EATON CORPORATION   (United States)

Author keywords

ECR HEATING; FABRICATION; ION SOURCES; PLASMA HEATING

Indexed keywords

EID: 0342279093     PISSN: 00346748     EISSN: 10897623     Source Type: Journal    
DOI: 10.1063/1.1148466     Document Type: Conference Paper

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