Simulation-based proximity correction in high-volume DRAM production

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4000, Issue , 2000, Pages

  Fischer, Werner ^a   Anke, Ines ^a   Schweeger, Giorgio ^a   Thiele, Jorg ^a  

^a INFINEON TECHNOLOGIES AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; MASKS; PHOTORESISTS; SEMICONDUCTING SILICON; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR DEVICE MODELS;

OPTICAL PROXIMITY CORRECTION (OPC);

DYNAMIC RANDOM ACCESS STORAGE;

EID: 0033681479     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)