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Volumn 44, Issue 9, 2003, Pages 1659-1662

Compact Coating of Tantalum on Tungsten Prepared by Molten Salt Electrodeposition

(8) Mehmood, Mazhar a,b Kawaguchi, Nobuaki a Maekawa, Hideki a Sato, Yuzuru a Yamamura, Tsutomu a Kawai, Masayoshi c Kikuchi, Kenji d Furusaka, Michihiro c

a TOHOKU UNIVERSITY (Japan)

b PAKISTAN INSTITUTE OF ENGINEERING AND APPLIED SCIENCES (Pakistan)

c HIGH ENERGY ACCELERATOR RESEARCH ORGANIZATION KEK (Japan)

d JAPAN ATOMIC ENERGY AGENCY (Japan)

Author keywords

Coating; Electrodeposition; Fluoride; Interface; Molten salt; Tantalum; Tungsten; Voltammetry and chronopotentiometry

Indexed keywords

CAPACITANCE; CONTAMINATION; DIFFUSION; ELECTRODEPOSITION; ELECTRODES; HEAT TREATMENT; INTERFACES (MATERIALS); MORPHOLOGY; SUBSTRATES; TANTALUM; TUNGSTEN;

VOLTAMMETRY;

COATING TECHNIQUES;

EID: 0242664793 PISSN: 13459678 EISSN: None Source Type: Journal
DOI: 10.2320/matertrans.44.1659 Document Type: Article

Times cited : (8)

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