Fundamentals of photothermal measurements for nondestructive testing;Grundlagen der photothermischen zerstörungsfreien Materialprüfung

Technisches Messen

Volumn 65, Issue 5, 1998, Pages 177-184

  Schmitz, Bernhard ^b   Geerkens, Jürgen ^b   Seidel, Uwe ^a   Goch, Gert ^b  

^a Agfa Deutschland   (Germany)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0242635090     PISSN: 01718096     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (13)

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2. Busse, G. und Walther, H.G.: Photothermal Non-destructive Evaluation of Materials with Thermal Waves, in: Mandelis, A. (Ed.): Progress in Photothermal and Photoacoustic Science and Technology. Elsevier, New York (1992), S. 207-298.
3. Mandelis, A. (Ed.): Nondestructive Evaluation (NDE), Progress in Photothermal and Photoacoustic Science and Technology. PTR Prentice Hall, Englewood Cliffs, New Jersey (1994).
4. Seidel, U., Lan, T.T.N., Walther, H.G., Schmitz, B., Geerkens, J. und Goch, G.: Quantitative Characterization of Material Inhomogeneities by Thermal Waves. Optical Engineering 36 (1997), S. 376-390.
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9. Walther, H.G., Friedrich, K., Haupt, K., Muratikov und K., Glazov, A.: New Phase Interference Technique Applied for Sensitive Photothermal Microscopy. Appl.Phys.Lett. 57 (1990), S. 1600-1601.
10. Coufal, H.: Photothermal Spectroscopy Using a Pyroelectric Thin Film. Appl. Phys. Lett. 44 (1984), S. 59-61.
11. Olmstead, M.A., Amer, N.M., Kohn, S., Fournier, D. und Boccara, A.C.: Photothermal Displacement Spectroscopy: An Optical Probe for Solids and Surfaces. Appl.Phys. A 32 (1983), S. 141-154.
12. Ehlert, A., Kerstan, M., Lundt, H., Huber, A., Helmreich, D., Geiler, H.D., Karge, H. und Wagner, M.: Selected Applications of Photothermal and Photoluminescence Heterodyne Techniques for Process Control in Silicon Wafer Manufacturing. Opt. Eng. 36 (1997), S. 446-458.
13. Goch, G. und Reigl, M.: Application of the Finite-Element-Method and the Finite-Difference-Method to Photothermal Inspections. J. Appl. Phys. 79 (1996), S. 9084-9089.