Theory and simulation of dopant implantation and diffusion in SiGe

Physica Status Solidi (B) Basic Research

Volumn 239, Issue 1, 2003, Pages 35-43

  Liu, Chun Li ^a   Orlowski, Marius ^a   Thean, Aaron ^a   Beardmore, Keith ^a   Barr, Alex ^a   White, Ted ^a   Nguyen, Bich Yen ^a   Rueda, Hernan ^a   Liu, Xiang Yang ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0242556818     PISSN: 03701972     EISSN: None     Source Type: Journal    
DOI: 10.1002/pssb.200303231     Document Type: Conference Paper

References (14)

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