Electrochemical behavior of Cu-xZn alloys in borate buffer solution at pH 9.2

Journal of the Electrochemical Society

Volumn 150, Issue 11, 2003, Pages

  Milosev I ^a,b   Strehblow, H H ^c  

^a JO EF STEFAN INSTITUTE   (Slovenia)

^b Valdoltra Orthopaedic Hospital   (Slovenia)

^c HEINRICH HEINE UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; BORON COMPOUNDS; COMPOSITION EFFECTS; CYCLIC VOLTAMMETRY; ELECTROCHEMISTRY; PASSIVATION; PH EFFECTS; REDUCTION; SOLUTIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

BORATE BUFFER SOLUTION; ELECTROCHEMICAL REDUCTION;

COPPER ALLOYS;

EID: 0242509214     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1615997     Document Type: Article

References (55)

1. S. M. Abd El Haleem, J. Electroanal. Chem. Interfacial Electrochem., 117, 309 (1981).
2. D. W. Shoesmith, S. Sunder, M. G. Bailey, G. J. Wallace, and F. W. Stanhell, J. Electroanal. Chem. Interfacial Electrochem., 143, 153 (1983).
3. H.-H. Strehblow and H.-D. Speckmann, Werkst. Korros., 143, 153 (1983).
4. J. Gomez Becerra, R. C. Salvarezza, and A. J. Arvia, Electrochim. Acta, 33, 613 (1988).
5. U. Collisi and H.-H. Strehblow, J. Electroanal. Chem. Interfacial Electrochem., 284, 285 (1990).
6. S. M. Wilhelm, Y. Tanizawa, C.-Y. Liu, and N. Hackerman, Corros. Sci., 22, 791 (1982).
7. H.-H. Strehblow and B. Titze, Electrochim. Acta, 25, 839 (1980).
8. W. Kautek and J. G. Gordon II, J. Electrochem. Soc., 137, 2672 (1990).
9. U. Sander, H.-H. Strehblow, and J. K. Dohrmann, J. Phys. Chem., 85, 447 (1981).
10. H.-H. Strehblow, U. Collisi, and P. Druska, in Control of Copper and Copper Alloys Oxidation, Editions de la Revue de Metallurgie, p. 33, Paris (1992).
11. M. Pourbaix, Atlas of Electrochemical Equilibria in Aqueous Solutions, NACE, Cebelcor, Houston, Brussels (1974).
12. A. E. Bohe, J. R. Vilche, K. Jüttner, W. J. Lorenz, and W. Paatsch, Electrochim. Acta, 34, 1443 (1989).
13. H. Mishima, B. A. Lopez de Mishima, E. Santos, C. P. De Pauli, K. Azumi, and N. Sato, Electrochim. Acta, 36, 1491 (1991).
14. D. D. Macdonald, K. M. Ismail, and E. Sikora, J. Electrochem. Soc., 145, 3141 (1998).
15. G. Heiland, E. Mollwo, and F. Stöckmann, Solid State Phys., 8, 191 (1959).
16. A. L. Rudd and C. B. Breslin, Electrochim. Acta, 45, 1571 (2000).
17. A. P. Pschelnikov, A. D. Sitnikov, I. K. Marshakov, and V. V. Losev, Electrochim. Acta, 26, 591 (1981).
18. A. V. Polunin, A. P. Pschelnikov, V. V. Losev, and I. K. Marshakov, Electrochim. Acta, 27, 467 (1982).
19. R. K. Dinnappa, and S. M. Mayanna, Corros. Sci., 27, 349 (1987).
20. J. Morales, P. Esparza, S. Gonzales, L. Vasquez, R. C. Salvarezza, and A. J. Arvia, Langmuir, 12, 500 (1996).
21. A. T. Cole, R. C. Newman, and K. Sieradzki, Corros. Sci., 28, 109 (1988).
22. T. Shahrabi, R. C. Newman, and K. Sieradzki, J. Electrochem. Soc., 140, 348 (1993).
23. V. A. Kolotyrkin, V. N. Chervyakov, A. P. Pschelnikov, and V. V. Losev, Prot. Met., 31, 220 (1995).
24. D. Tromans, Corros. Sci., 39, 1307 (1997).
25. X. Guo, K. Gao, L. Qiao, and W. Chu, Metall. Mater. Trans. A, 32A, 1309 (2001).
26. S. H. Sanad, H. Abbas, A. A. Ismail, and K. M. El-Sobki, Surf. Technol., 25, 39 (1985).
27. H. C. Shih and R. J. Tzou, J. Electrochem. Soc., 138, 958 (1991).
28. V. Otieno-Alego, D. P. Schweinsberg, G. A. Hope, and T. Notoya, Corros. Sci., 38, 213 (1996).
29. A. M. Fenelon and C. B. Breslin, J. Appl. Electrochem., 31, 509 (2001).
30. M. M. Osman, Mater. Chem. Phys., 71, 12 (2001).
31. A. Nagiub and F. Mansfeld, Corros. Sci., 43, 2147 (2001).
32. K. Habib and A. Amin, Desalination, 85, 275 (1992).
33. A. M. Shams El Din, Desalination, 93, 499 (1993).
34. M. Kabasakaloglu, T. Kiyak, O. Sendil, and A. Asan, Appl. Surf. Sci., 193, 167 (2002).
35. B.-S. Kim, T. Piao, S. N. Hoier, and S.-M. Park, Corros. Sci., 37, 557 (1995).
36. J. Morales, G. T. Fernandez, P. Esparza, S. Gonzales, R. C. Salvarezza, and A. J. Arvia, Corros. Sci., 37, 211 (1995).
37. J. Morales, P. Esparza, G. T. Fernandez, S. Gonzales, J. E. Garcia, J. Caceres, R. C. Salvarezza, and A. J. Arvia, Corros. Sci., 37, 231 (1995).
38. A. L. Rudd and C. B. Breslin, Electrochim. Acta, 45, 4015 (2000).
39. W. A. Badawy, S. S. El-Egamy, and A. S. El-Azab, Corros. Sci., 37, 1969 (1995).
40. G. Cepria, C. Aranda, J. Perez-Arantegui, F. Lacueva, and J. R. Castillo, J. Electroanal. Chem., 513, 52 (2001).
41. C. D. Wagner, L. H. Gale, and R. H. Raymond, Anal. Chem., 51, 466 (1979).
42. T. L. Barr, Crit. Rev. Anal. Chem., 22, 113 (1991).
43. N. S. McIntyre, S. Sunder, D. W. Shoesmith, and F. W. Stanchell, J. Vac. Sci. Technol., 18, 714 (1981).
44. J. E. Castle and D. Epler, Proc. R. Soc. London, 339, 49 (1974).
45. H.-D. Speckmann, S. Haupt, and H.-H. Strehblow, Surf. Interface Anal., 11, 148 (1988).
46. P. Druska and H.-H. Strehblow, Surf. Interface Anal., 23, 440 (1995).
47. M. P. Seah, in Practical Surface Analysis by AES and XPS, D. Briggs and M. P. Seah, Editors, p. 201, John Wiley & Sons, New York (1990).
48. M. Wolff, Thesis, Heinrich-Heine Universität, Düsseldorf (1992).
49. J. H. Scofield, J. Electron Spectrosc. Relat. Phenom., 8, 129 (1976).
50. R. F. Reilman, A. Msezane, and S. T. Manson, J. Electron Spectrosc. Relat. Phenom., 8, 389 (1976).
51. M. R. Gennero de Chialvo, S. L. Marchiano, and A. J. Arvia, J. Appl. Electrochem., 14, 165 (1984).
52. M. Nurul Islam, T. B. Ghosh, K. L. Chopra, and H. N. Acharya, Thin Solid Films, 280, 20 (1996).
53. J. H. Fox, J. D. Nuttall, and T. E. Gallon, Surf. Sci., 63, 390 (1977).
54. H.-H. Strehblow, V. Maurice, and P. Marcus, Electrochim. Acta, 46, 3755 (2001).
55. M. P. Seah and W. A. Dench, Surf. Interface Anal., 1, 2 (1979).