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Volumn 266-269 A, Issue , 2000, Pages 141-145

High quality unhydrogenated low-pressure chemical vapor deposited polycrystalline silicon

a CNRS (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0242500634 PISSN: 00223093 EISSN: None Source Type: Journal
DOI: 10.1016/s0022-3093(00)00013-2 Document Type: Article

Times cited : (10)

References (11)

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