Quantification issues of trace metal contaminants on silicon wafers by means of TOF-SIMS and ICP-MS

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5133, Issue , 2003, Pages 21-30

  Rostam Khani, P ^a   Vullings, P ^a   Noij, G ^a   Claassen, W ^a  

^a NXP SEMICONDUCTORS   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

CONTAMINATION; INDUCTIVELY COUPLED PLASMA; REMOVAL; SCANNING; SECONDARY ION MASS SPECTROMETRY; SENSITIVITY ANALYSIS; SURFACES;

METAL CONTAMINATION;

SILICON WAFERS;

EID: 0242469000     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)

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