Transmission electron microscopy investigation of the effect of deposition conditions and a platinum layer in gas-sensitive r.f.-sputtered SnO2 films

Thin Solid Films

Volumn 445, Issue 1, 2003, Pages 38-47

  Serventi, A M ^a,b   Rickerby, D G ^a   Horrillo, M C ^c   Saint Jacques, R G ^b  

^a JOINT RESEARCH CENTRE   (Italy)

^b INRS EMT   (Canada)

^c CSIC   (Spain)

Author keywords

Gas sensors; Nanostructured thin films; Platinum doping; Tin oxide

Indexed keywords

ALUMINA; ARGON; CHEMICAL SENSORS; DEPOSITION; DOPING (ADDITIVES); MICROSTRUCTURE; OXYGEN; PLATINUM; POLYCRYSTALLINE MATERIALS; SPUTTERING; TIN COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY;

INTERCOLUMNAR POROSITY;

THIN FILMS;

EID: 0242366730     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.08.056     Document Type: Article

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