Infrared optical properties of diamond films and electrical properties of CVD diamond detectors

Journal of Physics D: Applied Physics

Volumn 36, Issue 20, 2003, Pages 2548-2552

  Wang, Linjun ^a   Xia, Yiben ^a   Shen, Hujiang ^a   Zhang, Minglong ^a   Yang, Ying ^a   Wang, Lin ^a  

^a SHANGHAI UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ELECTRIC PROPERTIES; ELLIPSOMETRY; HYDROGEN PEROXIDE; INFRARED SPECTROSCOPY; LEAKAGE CURRENTS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SILICON; SINGLE CRYSTALS; SULFURIC ACID; TEMPERATURE;

DIAMOND X-RAY DETECTORS; INFRARED OPTICAL QUALITY; INFRARED SPECTROSCOPIC ELLIPSOMETRY; SURFACE OXIDIZING TREATMENT; X-RAY IRRADIATION;

DIAMOND FILMS;

EID: 0242336742     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/36/20/019     Document Type: Article

References (8)

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