Preparation of PLZT ferroelectric films by RF sputtering on 200mmφ substrate

Integrated Ferroelectrics

Volumn 46, Issue , 2002, Pages 105-114

  Kikuchi, S ^a   Miyaguchi, Y ^a   Jimbo, T ^a   Kimura, I ^a   Tanimura, M ^a   Suu, K ^a   Ishikawa, M ^a  

^a ULVAC INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; FERROELECTRIC MATERIALS; FLUORESCENCE; LEAD COMPOUNDS; LOW TEMPERATURE EFFECTS; MAGNETRON SPUTTERING; SUBSTRATES; X RAY SPECTROSCOPY;

DEPOSITION RATE; MULTICHAMBER PRODUCTION SYSTEMS; X-RAY FLUORESCENCE SPECTROSCOPY (XRF);

FERROELECTRIC THIN FILMS;

EID: 0242327582     PISSN: 10584587     EISSN: 16078489     Source Type: Conference Proceeding    
DOI: 10.1080/10584580215379     Document Type: Article

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