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Volumn , Issue , 2003, Pages 85-88

Deposition of Coatings via Atmospheric Plasma-Enhanced CVD

Author keywords

Atmospheric pressure deposition; Corona discharge; Permeation barrier coatings; Silica coatings

Indexed keywords

ATMOSPHERIC PRESSURE; ATOMIC FORCE MICROSCOPY; DEPOSITION; SCANNING ELECTRON MICROSCOPY; SILICA; SUBSTRATES;

EID: 0242322441     PISSN: 07375921     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (3)

References (9)
  • 1
    • 29844439371 scopus 로고
    • Synthesis of Plasma-Polymerized Tetraethoxy silane and Haxamethyldisiloxane Films Prepared by Atmospheric Pressure Glow Discharge
    • Y. Sawada, S. Ogawa, M. Kogoma, "Synthesis of Plasma-Polymerized Tetraethoxy silane and Haxamethyldisiloxane Films Prepared by Atmospheric Pressure Glow Discharge," J. Phys. D: Appl. Phys., 28, 1661, 1995.
    • (1995) J. Phys. D: Appl. Phys. , vol.28 , pp. 1661
    • Sawada, Y.1    Ogawa, S.2    Kogoma, M.3
  • 2
    • 0031388580 scopus 로고    scopus 로고
    • Plasma-Enhanced chemical-Vapor-Deposition of Thin Films by Corona Discharge at Atmospheric Pressure
    • R. Thyen, A. Weber, C.-P. Klages, "Plasma-Enhanced chemical-Vapor-Deposition of Thin Films by Corona Discharge at Atmospheric Pressure," Surf. Coat. Technol., 97, 426, 1997.
    • (1997) Surf. Coat. Technol. , vol.97 , pp. 426
    • Thyen, R.1    Weber, A.2    Klages, C.-P.3
  • 3
    • 0034435659 scopus 로고    scopus 로고
    • Thin Films Deposition from Hexamethyldisiloxane and Hexamethyldisilazane under Dielectric-Barrier Discharge Conditions
    • K. Schmidt-Szalowski, et.al., "Thin Films Deposition from Hexamethyldisiloxane and Hexamethyldisilazane under Dielectric-Barrier Discharge Conditions," Plasm. Polym., 5, 173, 2000.
    • (2000) Plasm. Polym. , vol.5 , pp. 173
    • Schmidt-Szalowski, K.1
  • 5
    • 0242367536 scopus 로고    scopus 로고
    • US Patent # 5718967
    • I.-F. Hu et al.,US Patent # 5718967; I.-F. Hu, J. C. Tou, US Patent # 5298587; I.-F. Hu et al, US Patent # 5718967; I.-F. Hu, J. C. Tou, US Patent # 5320875.
    • Hu, I.-F.1
  • 6
    • 0242336007 scopus 로고    scopus 로고
    • US Patent # 5298587
    • I.-F. Hu et al.,US Patent # 5718967; I.-F. Hu, J. C. Tou, US Patent # 5298587; I.-F. Hu et al, US Patent # 5718967; I.-F. Hu, J. C. Tou, US Patent # 5320875.
    • Hu, I.-F.1    Tou, J.C.2
  • 7
    • 0242336008 scopus 로고    scopus 로고
    • US Patent # 5718967
    • I.-F. Hu et al.,US Patent # 5718967; I.-F. Hu, J. C. Tou, US Patent # 5298587; I.-F. Hu et al, US Patent # 5718967; I.-F. Hu, J. C. Tou, US Patent # 5320875.
    • Hu, I.-F.1
  • 8
    • 0242272709 scopus 로고    scopus 로고
    • US Patent # 5320875
    • I.-F. Hu et al.,US Patent # 5718967; I.-F. Hu, J. C. Tou, US Patent # 5298587; I.-F. Hu et al, US Patent # 5718967; I.-F. Hu, J. C. Tou, US Patent # 5320875.
    • Hu, I.-F.1    Tou, J.C.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.