Deposition of Sno2 Coatings Using a Rectangular Filtered Vacuum Arc Source

Proceedings, Annual Technical Conference - Society of Vacuum Coaters

Volumn , Issue , 2003, Pages 278-283

  Boxman, R L ^a   Zhitomirsky, V ^a   Goldsmith, S ^a   David, T ^a   Dikhtyar, V ^a  

^a TEL AVIV UNIVERSITY   (Israel)

Author keywords

Conductive transparent oxide; Filtered vacuum arc deposition; In line deposition system; SnO2

Indexed keywords

CATHODES; COATINGS; DEPOSITION;

ION CURRENTS;

TIN COMPOUNDS;

EID: 0242290770     PISSN: 07375921     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)

1. 2 transparent conductor films produced by filtered vacuum arc deposition", Thin Solid Films 216, 20, 1993.
2. L. Kaplan, V.N. Zhitomirsky, S. Goldsmith, R.L. Boxman, I. Rusman, "Arc behavior during filtered vacuum arc deposition of Sn-O thin films", Surface Coat. Technol. 76-77, 181, 1995.
3. L. Kaplan, I. Rusman, R.L. Boxman, S. Goldsmith, M. Nathan, E. Ben-Jacob, "STM and XPS study of filtered vacuum arc deposited Sn-O films", Thin Solid Films 290-291, 355, 1996.
4. V.N. Zhitomirsky, L. Kaplan, R.L. Boxman, S. Goldsmith, "Ion current distriburion in a filtered vacuum arc deposition system", Surface Coat. Technol., 76-77, 190, 1995.
5. P.J. Martin and A. Bendavid, "Review of the filtered vacuum arc process and materials deposition", Thin Solid Films 394, 1, 2001.
6. R.P. Welty, U.S. Patent 5,997,705, "Rectangular filtered arc plasma source", 7 Dec. 1999.
7. V.I. Gorokhovsky, R. Bhattacharya and D.G. Bhat, "Characterization of Large Area Filtered Arc Deposition Technology: I-Plasma Processing Parameters", Surf. Coat. Technol. 140, 82, 2000.