Influences of Pulse Parameters on Properties of Optical Coatings Deposited by Reactive Pulsed Magnetron Sputtering

Proceedings, Annual Technical Conference - Society of Vacuum Coaters

Volumn , Issue , 2003, Pages 377-382

  Vanecek, R ^a   Liebig, J S ^a   Sahm, H ^a  

^a Fraunhofer Institute for Electron Beam and Plasma Technology   (Germany)

Author keywords

Multilayer stacks; Optical coatings; Pulsed sputtering; Reactive sputtering

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELLIPSOMETRY; MAGNETRON SPUTTERING; OPTICAL MULTILAYERS; SILICON WAFERS; X RAY DIFFRACTION;

MULTILAYER STACKS;

OPTICAL COATINGS;

EID: 0242290405     PISSN: 07375921     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (10)

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