Rapid photo-assisted forming gas anneal (FGA) for high quality screen-printed contacts for silicon solar cells

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn 2000-January, Issue , 2000, Pages 264-267

  Ebong, A ^a   Hillali, M ^a   Rohatgi, A ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COST EFFECTIVENESS; COSTS; CRYSTALLINE MATERIALS; ELECTRIC RESISTANCE; PHASE INTERFACES; SCREEN PRINTING; SILICON; SOLAR CELLS;

FIRING CONDITIONS; HIGH SERIES RESISTANCES; MULTI-CRYSTALLINE SILICON; MULTICRYSTALLINE; RESISTIVE LOSS; SCREEN-PRINTED; SERIES RESISTANCES; SINGLE-CRYSTALLINE MATERIALS;

SILICON SOLAR CELLS;

EID: 0242264185     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2000.915808     Document Type: Conference Paper

References (6)

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3. th IEEE PVSC, 1997
4. nd WCPVSC, 1998, pp. 1970-1973.
5. A. Rohatgi, S. Narasimha, A. Ebong, and P. Doshi, "Understanding and Implementation of Rapid Thermal Technologies for High Efficiency Silicon Solar Cells", IEEE Trans. On Electron Dev., 46(10), 1999, pp. 1970-1977,.
6. nd WCPVSC, 1998, pp. 1523-1526.