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Volumn 219, Issue 3-4, 2003, Pages 363-369

Gd silicides formation: Heat treatment of coadsorbed Si and Gd ultrathin films on a W(1 1 1) surface

Author keywords

Field emission; Gadolinium; Low index single crystal surfaces; Metal metal interfaces; Metal semiconductor interfaces; Silicides; Silicon; Tungsten; Work function measurements

Indexed keywords

GADOLINIUM; HEAT TREATMENT; SILICON; STOICHIOMETRY; THERMAL EFFECTS; TUNGSTEN; ULTRATHIN FILMS;

EID: 0142247126     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(03)00708-6     Document Type: Article
Times cited : (6)

References (22)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.