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Volumn 219, Issue 3-4, 2003, Pages 363-369
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Gd silicides formation: Heat treatment of coadsorbed Si and Gd ultrathin films on a W(1 1 1) surface
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Author keywords
Field emission; Gadolinium; Low index single crystal surfaces; Metal metal interfaces; Metal semiconductor interfaces; Silicides; Silicon; Tungsten; Work function measurements
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Indexed keywords
GADOLINIUM;
HEAT TREATMENT;
SILICON;
STOICHIOMETRY;
THERMAL EFFECTS;
TUNGSTEN;
ULTRATHIN FILMS;
FIELD EMISSION;
GADOLINIUM COMPOUNDS;
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EID: 0142247126
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/S0169-4332(03)00708-6 Document Type: Article |
Times cited : (6)
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References (22)
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