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Volumn , Issue , 2001, Pages 395-398

600V bipolar power devices on thick SOI

Author keywords

[No Author keywords available]

Indexed keywords

POWER DEVICES; THICK SOI;

EID: 0142212502     PISSN: 19308876     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ESSDERC.2001.195284     Document Type: Conference Paper
Times cited : (6)

References (7)
  • 1
    • 0029709963 scopus 로고    scopus 로고
    • Bonded SOI technologies for high voltage applications
    • Takao Abe et al. " Bonded SOI Technologies for High Voltage Applications", Proc. of 8thISPSD, 1996, p. 41
    • (1996) Proc. of 8thISPSD , pp. 41
    • Abe, T.1
  • 2
    • 0029203351 scopus 로고
    • A dielectric isolated high-voltage IC-Technology for Off-line applications
    • M. Stoisiek et al. " A dielectric isolated high-voltage IC-Technology for Off-line applications", Proc. of 7th ISPSD, 1995,p. 325
    • (1995) Proc. of 7th ISPSD , pp. 325
    • Stoisiek, M.1
  • 3
    • 84907489068 scopus 로고    scopus 로고
    • Intelligent power Ics on bonded silicon wafers
    • M. Lida et al. " Intelligent power Ics on bonded silicon wafers", El. Chem. Soc. Proc. vol 97-36, p. 481
    • El. Chem. Soc. Proc. , vol.97 , Issue.36 , pp. 481
    • Lida, M.1
  • 4
    • 84907548996 scopus 로고    scopus 로고
    • A 500V 1A 1-chip inverter IC on SOI wafer
    • May
    • K. Endo et al. " A 500V 1A 1-chip inverter IC on SOI wafer", PCIMProc. May 1998, p. 145
    • (1998) PCIMProc , pp. 145
    • Endo, K.1
  • 5
    • 0002773862 scopus 로고    scopus 로고
    • 600V power conversion system-on-a-chip based on thin layer SOI
    • T. Letavic et al. " 600V power conversion system-on-a-chip based on thin layer SOI", Proc. of 11th ISPSD, 1999, p. 325
    • (1999) Proc. of 11th ISPSD , pp. 325
    • Letavic, T.1
  • 6
    • 0032180998 scopus 로고    scopus 로고
    • Noise current induced by switching of a dielectric isolated lateral insulated gate bipolar transistor on silicon on insulator
    • H. Sumida, A. Hirabayashi, "noise current induced by switching of a dielectric isolated lateral insulated gate bipolar transistor on silicon on insulator", J. Appl. Phys. Vol 37 (1998).
    • (1998) J. Appl. Phys. , vol.37
    • Sumida, H.1    Hirabayashi, A.2
  • 7
    • 84907524447 scopus 로고    scopus 로고
    • Deep trench isolation in bonded wafer SOI Ics using high density ICP etcher
    • C. S. Cowen et al. " Deep trench isolation in bonded wafer SOI Ics using high density ICP etcher", El. Chem. Soc. Proc. vol 96-3, p. 364
    • El. Chem. Soc. Proc. , vol.96 , Issue.3 , pp. 364
    • Cowen, C.S.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.