Two stage oxidation in epitaxial Ni (111)/GaN (0001) thin films

Applied Physics Letters

Volumn 83, Issue 11, 2003, Pages 2139-2141

  Kang, H C ^a,b   Seo, S H ^a   Jang, H W ^a   Kim, D H ^a   Noh, D Y ^a  

^a Gwangju Institute of Science and Technology (GIST)   (South Korea)

^b ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; GALLIUM NITRIDE; NICKEL; OXIDATION; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; X RAY SCATTERING;

SURFACE OXIDATION;

THIN FILMS;

EID: 0142121628     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1610248     Document Type: Article

References (14)

1. J.-K. Ho, C.-S. Jong, C. C. Chiu, C.-N. Huang, K.-K. Shih, L.-C. Chen, F.-R. Chen, and J.-J. Kai, J. Appl. Phys. 86, 4491 (1999).
2. C. C. Kim, J. K. Kim, J.-L. Lee, J. H. Je, M. S. Yi, D. Y. Noh, Y. Hwu, and P. Ruterana, Appl. Phys. Lett. 78, 3773 (2001).
3. S. Nakamura and G. Fasol, The Blue Laser Diode (Springer, Heidelberg, 1997).
4. P. H. Holloway and J. B. Hudson, Surf. Sci. 43, 123 (1974).
5. R. S. Saiki, A. P. Kaduwela, J. Osterwalder, and C. S. Fadley, Phys. Rev. B 40, 1586 (1989).
6. E. Kopatzki and R. J. Behm, Phys. Rev. Lett. 74, 1399 (1995).
7. S. Hildebrandt, Ch. Hagendorf, T. Doege, C. Jeckstiess, R. Kulla, H. Neddermeyer, and T. Uttich, J. Vac. Sci. Technol. A 18, 1010 (2000).
8. N. Cabrera and N. F. Mott, Rep. Prog. Phys. 12, 163 (1949).
9. J. C. Yang, M. Yeadon, B. Kolasa, and J. M. Gibson, Appl. Phys. Lett. 70, 3522 (1997).
10. J. Liu, J. P. Lu, P. W. Chu, and J. M. Blakely, J. Vac. Sci. Technol. A 10, 2355 (1992).
11. H. C. Kang, S. H. Seo, J. W. Kim, and D. Y. Noh, Appl. Phys. Lett. 80, 1364 (2002).
12. A. T. Fromhold, Jr., Theory of Metal Oxidation (North-Holland, Amsterdam, 1976), Vol. 1.
13. B. E. Warren, X-ray Diffraction (Addison-Wesley, MA, 1969), Chap. 4.
14. D. F. Mitchell and M. J. Graham, Surf. Sci. 114, 546 (1982).