New methods to modify epitaxy at Cu-alumina interfaces

Microscopy and Microanalysis

Volumn 9, Issue SUPPL. 3, 2003, Pages 298-299

  Scheu, Christina ^a   Oh, Sang Ho ^a   Wagner, Thomas ^a   Rühle, Manfred ^a  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0142091255     PISSN: 14319276     EISSN: None     Source Type: Journal    
DOI: 10.1017/s1431927603024140     Document Type: Conference Paper

References (4)

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2. M. Gautier, J. P. Durand and L. P. Van, Surface Science Letters 249, (1991) L327.
3. S. Gota, M. Gautier, L. Douillard, J. P. Durand and P. L. Fevre, Surface Science 352, (1996) 1016.
4. G. Dehm, C. Scheu, G. Möbus, R. Brydson and M. Rühle, Ultramicroscopy 67, (1997) 207.