The initial stages of the growth of copper on a (1 × 1) and a (√31 × √31)R ± 9° α-Al2O3(0001) surface

Surface Science

Volumn 352-354, Issue , 1996, Pages 1016-1021

  Gota, S ^a   Gautier Soyer, M ^a   Douillard, L ^a   Duraud, J P ^a   Le Fevre, P ^b  

^a CEA SACLAY   (France)

^b Lab Utilisation Rayon E   (France)

Author keywords

Aluminum oxide; Copper; Low index single crystal surfaces; Metal oxide thin film; Surface extended X ray adsorption fine structure (SEXAFS)

Indexed keywords

ABSORPTION SPECTROSCOPY; ALUMINA; ATOMS; CHEMICAL BONDS; CRYSTAL GROWTH; DEPOSITION; INTERFACES (MATERIALS); LOW ENERGY ELECTRON DIFFRACTION; NANOSTRUCTURED MATERIALS; SUBSTRATES; SURFACE PHENOMENA; X RAY ANALYSIS;

ALUMINA SUBSTRATES; COPPER ALUMINA INTERFACES; COPPER DIMERS; COPPER GROWTH; LOW INDEX SINGLE CRYSTAL SURFACES; RECONSTRUCTED SUBSTRATE; SURFACE SENSITIVE X RAY ABSORPTION SPECTROSCOPY;

COPPER;

EID: 0030145722     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/0039-6028(95)01319-9     Document Type: Article

References (18)

1. V.E. Henrich and P.A. Cox, The Surface Science of Metal Oxides, Ch. 7 (Cambridge University Press, Cambridge, 1994).
2. S. Gota, M. Gautier, L. Douillard, N. Thromat, J.P. Duraud and P. Le Fevre, Surf. Sci. 323 (1995) 163.
3. M. Gautier, J.P. Duraud and L. Pham Van, Surf. Sci. (1991) L327; M. Gautier, L. Pham Van and J.P. Duraud, Europhys. Lett. 18 (1992) 175.
4. M. Gautier, J.P. Duraud and L. Pham Van, Surf. Sci. (1991) L327; M. Gautier, L. Pham Van and J.P. Duraud, Europhys. Lett. 18 (1992) 175.
5. M. Gautier, J.P. Duraud, L. Pham Van and M.J. Guittet, Surf. Sci. 250 (1991) 71.
6. M. Gautier, G. Renaud, L. Pham Van, B. Villette, M. Pollak, N. Thromat, F. Jollet and J.P. Duraud, J. Am. Ceram. Soc. 77 (1994) 323.
7. G. Renaud, B. Villette, I. Vilfan and A. Bourret, Phys. Rev. Lett 73 (1994) 1825.
8. For a review, see for example X-ray Absorption: Principles, Applications, Techniques of EXAFS, SEXAFS and XANES, Eds. D.C. Kronisberger and R. Prins, Wiley Series of Chemical Analysis, Vol. 92 (Wiley, New York, 1988).
9. B.K. Teo, EXAFS: Basic principles and data analysis (Springer, Berlin, 1984).
10. A.G. McKale, B.W. Veal, A.P. Paulikas, S.K. Chan and G.S. Knapp, J. Am. Chem. Soc. 110 (1988) 3763.
11. G. Apai, J.F. Hamilton, J. Stöhr and A. Thompson, Phys. Rev. Lett. 43 (1979) 165.
12. P.A. Montano, G.K. Shenoy, E.E. Alp, W. Schulze and J. Urban, Phys. Rev. Lett. 64 (1990) 3155.
13. L.B. Hansen, P. Stoltze, J.K. Norskov, B.S. Clausen and W. Niemann, Phys. Rev. Lett. 64 (1995) 5315.
14. A. Pinto, A.R. Pennisi, G. Faraci, G. D'Agostino, S. Mobilio and F. Boscherini, Phys. Rev. B 51 (1995) 5315.
15. J. Guo, D.E. Ellis and D.J. Lam, Phys. Rev. B 45 (1992) 13647.
16. U. Diebold, J.M. Pan and T.E. Madey, Phys. Rev. B 47 (1993) 3868; Surf. Sci. 287/288 (1993) 806.
17. U. Diebold, J.M. Pan and T.E. Madey, Phys. Rev. B 47 (1993) 3868; Surf. Sci. 287/288 (1993) 806.
18. H. Chen and S.M. Heald, Phys. Rev. B 42 (1990) 4913.