In-situ study of stress evolution during solid state reaction of Pd with Si(001) using synchrotron radiation

Microelectronic Engineering

Volumn 70, Issue 2-4, 2003, Pages 436-441

  Megdiche, M ^a   Gergaud, P ^a   Curtil, C ^a   Thomas, O ^a   Chenevier, B ^a   Mazuelas, A ^b  

^a CNRS   (France)

^b EUROPEAN SYNCHROTRON RADIATION FACILITY   (France)

Author keywords

Pd silicide; Reactivity; Stress; Thin films

Indexed keywords

COMPRESSIVE STRESS; PALLADIUM; SILICON; SYNCHROTRON RADIATION; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

SOLID STATE REACTIONS;

STRESS ANALYSIS;

EID: 0142075264     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(03)00427-1     Document Type: Conference Paper

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