Improvement of electrical properties of ferroelectric gate oxide structure by using Al2O3 thin films as buffer insulator

Thin Solid Films

Volumn 444, Issue 1-2, 2003, Pages 276-281

  Choi, Hoon Sang ^a,b   Lim, Geun Sik ^a   Lee, Jong Han ^a   Kim, Yong Tae ^b   Kim, Seong Il ^b   Yoo, Dong Chul ^c   Lee, Jeong Yong ^c   Choi, In Hoon ^a  

^a Korea University   (South Korea)

^b Korea Institute of Science and Technology   (South Korea)

^c Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

Buffer layer; Ferroelectric; Memory window; Metal ferroelectric insulator semiconductor structure

Indexed keywords

ALUMINA; DIFFUSION; ELECTRIC INSULATORS; FERROELECTRIC MATERIALS;

MEMORY WINDOW;

THIN FILMS;

EID: 0142043287     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)01099-X     Document Type: Article

References (15)

1. Scott J.F., Kammerdiner L., Parris M., Traynor S., Ottanbachar V., Shawbketh A., Oliver W.C. J. Appl. Phys. 64:1988;787.
2. Evans J.T., Womack R. IEEE J. Solid State Circuits. 23:1988;610.
3. Ishiwara H. Jpn. J. Appl. Phys. 32:1993;442.
4. Sinharoy S., Bobay H., Lampe D.R., Francombe M.H. J. Vac. Sci. Technol. A. 10:1992;1554.
5. Paz de Araujo C.A., Cuchlaro J.D., McMillan L.D., Scott M.C., Scott J.F. Nature. 374:1995;627.
6. Amanuma K., Hase T., Miyasaka Y. Appl. Phys. Lett. 66:1995;221.
7. Tokumitsu E., Itani K., Moon B.K., Ishiwara H. Jpn. J. Appl. Phys. 34:1995;5202.
8. Lim M., Kalkur T.S. Integr. Ferroelectr. 14:1997;247.
9. Ponce F.A. Appl. Phys. Lett. 41:1982;371.
10. Moulder J.F., Stickle W.F., Sobol P.E., Bomben K.D. Chastain J., King R.C. Jr. Handbook of X-ray Photoelectron Spectroscopy. 1995;Physical Electronics, Inc, Minnesota.
11. Koiwa I., Okada Y., Mita J., Hashimoto A., Sawada Y. Jpn. J. Appl. Phys. 36:1997;5904.
12. Watanabe K., Tanaka M., Sumitomo E., Katori K., Yogi H., Scott J.F. Appl. Phys. Lett. 73:1998;126.
13. Lettieri J., Zurbuchen M.A., Jia Y., Schlom D.G., Streiffer S.K., Hawley M.E. Appl. Phys. Lett. 77:2000;3090.
14. Lettieri J., Zurbuchen M.A., Jia Y., Schlom D.G., Streiffer S.K., Hawley M.E. Appl. Phys. Lett. 76:2000;2937.
15. Asayama G., Lettieri J., Zurbuchen M.A., Jia Y., Trolier-McKinstry S., Schlom D.G., Streiffer S.K., Maria J.P., Bu S.D., Eom C.B. Appl. Phys. Lett. 80:2002;2371.