High resolution photoemission study of growth, alloying, and intermixing of ultrathin ruthenium films on W(1 1 1) and W(2 1 1)

Surface Science

Volumn 544, Issue 2-3, 2003, Pages 193-208

  Gladys, M J ^a   Jackson, G ^a   Rowe, J E ^b,c   Madey, T E ^a  

^a RUTGERS UNIVERSITY   (United States)

^b NORTH CAROLINA STATE UNIVERSITY   (United States)

^c U S ARMY RESEARCH OFFICE   (United States)

Author keywords

Alloys; Faceting; Growth; Low energy electron diffraction (LEED); Ruthenium; Single crystal surfaces; Tungsten; X ray photoelectron spectroscopy

Indexed keywords

ANNEALING; HIGH TEMPERATURE EFFECTS; LOW ENERGY ELECTRON DIFFRACTION; PHOTOEMISSION; RUTHENIUM; SINGLE CRYSTALS; TUNGSTEN; X RAY PHOTOELECTRON SPECTROSCOPY;

PHOTON ENERGIES;

ULTRATHIN FILMS;

EID: 0141924612     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2003.06.001     Document Type: Article

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