Electron cyclotron resonance negative ion source

Review of Scientific Instruments

Volumn 71, Issue 2 II, 2000, Pages 935-938

  Fukumasa, Osamu ^a   Matsumori, Masanori ^a  

^a YAMAGUCHI UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0141907096     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1150350     Document Type: Article

References (12)

1. K. Hashimoto and S. Asano, Fusion Eng. Des. 26, 495 (1995).
2. M. Mozjetchkov, T. Takanashi, Y. Oka, K. Tsumori, M. Osakabe, O. Kaneko, Y. Takeiri, and T. Kuroda, Rev. Sci. Instrum. 69, 971 (1998).
3. T. Takanashi, Y. Takeiri, O. Kaneko, Y. Oka, K. Tsumori, and T. Kuroda, Rev. Sci. Instrum. 67, 1024 (1996).
4. T. Takanashi, Y. Takeiri, O. Kaneko, Y. Oka, K. Tsumori, and T. Kuroda, Jpn. J. Appl. Phys., Part 1 35, 2356 (1996).
5. T. Ikushima, Y. Okuno, and H. Fujita, Appl. Phys. Lett. 64, 25 (1994).
6. O. Fukumasa and M. Matsumori, Jpn. J. Appl. Phys., Part 1 38, 4581 (1999).
7. O. Fukumasa and N. Tsuda, Proceedings of the 8th International Symposium on the Production and Neutralization of Negative Ions and Beams, Giens, 1997, p. 165.
8. O. Fukumasa and M. Matsumori, The Korea-Japan Joint Workshop on Plasma Technologies and Applications, October 9-10, 1998, EP-98-75.
9. O. Fukumasa, J. Phys. D 22, 1668 (1989).
10. O. Fukumasa, J. Appl. Phys. 71, 3193 (1992).
11. O. Fukumasa, H. Naitou, and S. Sakiyama, Trans. Inst. Electr. Eng. Jpn., Part A 111A, 1057 (1991).
12. O. Fukumasa, H. Naitou, and S. Sakiyama, J. Appl. Phys. 74, 848 (1993).