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Volumn 35, Issue 4 A, 1996, Pages 2356-2362

Plasma characteristics of a large rf-driven negative hydrogen ion source

Author keywords

Inductively coupled discharge; Magnetic filter; NBI; Negative hydrogen ion; rf driven negative ion source; Volume production

Indexed keywords

ELECTRIC CURRENTS; ELECTRONIC DENSITY OF STATES; HYDROGEN; MAGNETIC FIELD EFFECTS; OPTIMIZATION; PARTICLE BEAM INJECTION; PLASMA DEVICES; PLASMAS; THERMAL EFFECTS; WAVE FILTERS;

EID: 0030121674     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.2356     Document Type: Article
Times cited : (11)

References (17)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.