-
1
-
-
84975332288
-
Mechanism of ozone formation in the silent electric discharge
-
Devins, J. C.; "Mechanism of Ozone Formation in the Silent Electric Discharge," J. Electroche. Soc., 103, 460-466 (1956)
-
(1956)
J. Electroche. Soc.
, vol.103
, pp. 460-466
-
-
Devins, J.C.1
-
2
-
-
0025522061
-
Ozone production in an oxygen-fed wire to cylinder ozonizer
-
Hadj-Ziane, S., B. Held, P. Pignolet, R. Peyrous, J. M. Benas and C. Coste; "Ozone Production in an Oxygen-Fed Wire to Cylinder Ozonizer," J. Phys. D: Appl. Phys., 23, 1390-1395 (1990)
-
(1990)
J. Phys. D: Appl. Phys.
, vol.23
, pp. 1390-1395
-
-
Hadj-Ziane, S.1
Held, B.2
Pignolet, P.3
Peyrous, R.4
Benas, J.M.5
Coste, C.6
-
3
-
-
21544438305
-
Plasma assisted decomposition of methanol and trichloroethylene in atmospheric pressure air streams by electrical discharge processing
-
Hsiao, M. C., B. T. Merritt, B. M. Penetrante, G. E. Vogtlin and P. H. Wallman; "Plasma Assisted Decomposition of Methanol and Trichloroethylene in Atmospheric Pressure Air Streams by Electrical Discharge Processing," J. Appl. Phys., 78, 3451-3456 (1995)
-
(1995)
J. Appl. Phys.
, vol.78
, pp. 3451-3456
-
-
Hsiao, M.C.1
Merritt, B.T.2
Penetrante, B.M.3
Vogtlin, G.E.4
Wallman, P.H.5
-
4
-
-
0007710394
-
x by electron beam
-
x by Electron Beam," Kagaku Kogaku, 53, 820-821 (1989)
-
(1989)
Kagaku Kogaku
, vol.53
, pp. 820-821
-
-
Kawamura, K.1
-
5
-
-
0028199522
-
Numerical simulation of ozone axial and radial distribution in a cylindrical oxygen-fed ozonizer
-
Loiseau, J. F., C. Lacassie, C. Monge, R. Peyrous, B. Held and C. Coste; "Numerical Simulation of Ozone Axial and Radial Distribution in a Cylindrical Oxygen-Fed Ozonizer," J. Phys. D: Appl. Phys., 27, 63-73 (1994)
-
(1994)
J. Phys. D: Appl. Phys.
, vol.27
, pp. 63-73
-
-
Loiseau, J.F.1
Lacassie, C.2
Monge, C.3
Peyrous, R.4
Held, B.5
Coste, C.6
-
6
-
-
0029356904
-
Theoretical analysis of removal of oxides of sulfur and nitrogen in pulsed operation of electrostatic precipitators
-
Lowke, J. J. and R. Morrow; "Theoretical Analysis of Removal of Oxides of Sulfur and Nitrogen in Pulsed Operation of Electrostatic Precipitators," IEEE Trans. Plasma Sci., 23, 661-671 (1995)
-
(1995)
IEEE Trans. Plasma Sci.
, vol.23
, pp. 661-671
-
-
Lowke, J.J.1
Morrow, R.2
-
7
-
-
0004118412
-
-
Cambridge Univ. Press, Cambridge, UK
-
Massay, S. H.; Negative Ions. Cambridge Univ. Press, Cambridge, UK (1976)
-
(1976)
Negative Ions
-
-
Massay, S.H.1
-
9
-
-
0009018198
-
Pulse corona induced plasma chemical process-a horizon of new plasma chemical technologies
-
Tokyo, Japan
-
Masuda, S.; "Pulse Corona Induced Plasma Chemical Process-A Horizon of New Plasma Chemical Technologies," Proc. 8th Int. Symp. on Plasma Chemistry, pp. 2187-2192, Tokyo, Japan (1987)
-
(1987)
Proc. 8th Int. Symp. on Plasma Chemistry
, pp. 2187-2192
-
-
Masuda, S.1
-
10
-
-
0003387849
-
x, and mercury vapor control of combustion gas
-
Padova, Italy
-
x, and Mercury Vapor Control of Combustion Gas," Proc. Int. Conf. on Electrostatic Precipitation, pp. 667-676, Padova, Italy (1987)
-
(1987)
Proc. Int. Conf. on Electrostatic Precipitation
, pp. 667-676
-
-
Masuda, S.1
Wu, Y.2
Urabe, T.3
Ono, Y.4
-
12
-
-
0024140722
-
Modeling of the electrostatic corona discharge reactor
-
Mukkavilli, S., C. K. Lee, K. Varghese and L. L. Tavlarides; "Modeling of the Electrostatic Corona Discharge Reactor," IEEE Trans. Plasma Sci., 16, 652-660 (1988)
-
(1988)
IEEE Trans. Plasma Sci.
, vol.16
, pp. 652-660
-
-
Mukkavilli, S.1
Lee, C.K.2
Varghese, K.3
Tavlarides, L.L.4
-
13
-
-
0024767204
-
Kinetic simulation of gaseous species created by an electrical discharge in dry or humid pxygen
-
Peyrous, R., P. Pignolet and B. Held; "Kinetic Simulation of Gaseous Species Created by an Electrical Discharge in Dry or Humid Oxygen," J. Phys. D: Appl. Phys., 22, 1658-1667 (1989)
-
(1989)
J. Phys. D: Appl. Phys.
, vol.22
, pp. 1658-1667
-
-
Peyrous, R.1
Pignolet, P.2
Held, B.3
-
14
-
-
0029673273
-
Removal of iodine and methyl iodide in gas by wetted-wall reactor based on selective electron attachment
-
Sano, N., T. Nagamoto, H. Tamon and M. Okazaki; "Removal of Iodine and Methyl Iodide in Gas by Wetted-Wall Reactor Based on Selective Electron Attachment," J. Chem. Eng. Japan, 29, 59-64 (1996)
-
(1996)
J. Chem. Eng. Japan
, vol.29
, pp. 59-64
-
-
Sano, N.1
Nagamoto, T.2
Tamon, H.3
Okazaki, M.4
-
15
-
-
0031237095
-
Removal of acetaldehyde and skatole in gas by a corona-discharge reactor
-
Sano, N., T. Nagamoto, H. Tamon, T. Suzuki and M. Okazaki; "Removal of Acetaldehyde and Skatole in Gas by a Corona-Discharge Reactor," Ind. Eng. Chem. Res., 36, 3783-3791 (1997)
-
(1997)
Ind. Eng. Chem. Res.
, vol.36
, pp. 3783-3791
-
-
Sano, N.1
Nagamoto, T.2
Tamon, H.3
Suzuki, T.4
Okazaki, M.5
-
16
-
-
0035674975
-
2 removal enhanced by water vapor using a corona-discharge reactor
-
2 Removal Enhanced by Water Vapor Using a Corona-Discharge Reactor," Chem. Eng. Technol., 24, 1295-1299 (2001)
-
(2001)
Chem. Eng. Technol.
, vol.24
, pp. 1295-1299
-
-
Sano, N.1
Nishimura, S.2
Kanki, T.3
Tamon, H.4
Tanthapanichakoon, W.5
Charinpanitkul, T.6
-
17
-
-
0029328802
-
New concept of gas purification by electron attachment
-
Tamon, H., H. Mizota, N. Sano, S. Schulze and M. Okazaki; "New Concept of Gas Purification by Electron Attachment," AIChE J., 41, 1701-1711 (1995)
-
(1995)
AIChE J.
, vol.41
, pp. 1701-1711
-
-
Tamon, H.1
Mizota, H.2
Sano, N.3
Schulze, S.4
Okazaki, M.5
-
18
-
-
0030131333
-
Influence of oxygen and water vapor on removal of sulfur compounds by electron attachment
-
Tamon, H., N. Sano and M. Okazaki; "Influence of Oxygen and Water Vapor on Removal of Sulfur Compounds by Electron Attachment," AIChE J., 42, 1481-1486 (1996)
-
(1996)
AIChE J.
, vol.42
, pp. 1481-1486
-
-
Tamon, H.1
Sano, N.2
Okazaki, M.3
-
19
-
-
0032121725
-
Removal of aromatic compounds in gas by electron attachment
-
Tamon, H., H. Imanaka, N. Sano, M. Okazaki and W. Tanthapanichakoon; "Removal of Aromatic Compounds in Gas by Electron Attachment," Ind. Eng. Chem. Res., 37, 2770-2774 (1998)
-
(1998)
Ind. Eng. Chem. Res.
, vol.37
, pp. 2770-2774
-
-
Tamon, H.1
Imanaka, H.2
Sano, N.3
Okazaki, M.4
Tanthapanichakoon, W.5
-
20
-
-
0007620583
-
Effect of structure of corona discharge on removal of dilute gaseous pollutants using selective electron attachment
-
Tanthapanichakoon, W., K. Larpsuriyakul, T. Charinpanitkul, N. Sano, H. Tamon and M. Okazaki; "Effect of Structure of Corona Discharge on Removal of Dilute Gaseous Pollutants Using Selective Electron Attachment," J. Chem. Eng. Japan, 31, 7-13 (1998)
-
(1998)
J. Chem. Eng. Japan
, vol.31
, pp. 7-13
-
-
Tanthapanichakoon, W.1
Larpsuriyakul, K.2
Charinpanitkul, T.3
Sano, N.4
Tamon, H.5
Okazaki, M.6
-
21
-
-
0001356868
-
Influence of chamber temperature on properties of the corona discharge system
-
Uhm, H. S.; "Influence of Chamber Temperature on Properties of the Corona Discharge System," Physics of Plasmas, 6, 623-626 (1999)
-
(1999)
Physics of Plasmas
, vol.6
, pp. 623-626
-
-
Uhm, H.S.1
-
22
-
-
0017957952
-
EHD study of the corona wind between wire and plate electrodes
-
Yabe, A., Y. Mori and K. Hijikata; "EHD Study of the Corona Wind between Wire and Plate Electrodes," AIAA J., 16, 340-345 (1978)
-
(1978)
AIAA J.
, vol.16
, pp. 340-345
-
-
Yabe, A.1
Mori, Y.2
Hijikata, K.3
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