Influence of Oxygen and Water Vapor on Removal of Sulfur Compounds by Electron Attachment

AIChE Journal

Volumn 42, Issue 5, 1996, Pages 1481-1486

  Tamon, Hajime ^a   Sano, Noriaki ^a   Okazaki, Morio ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

OXYGEN; REMOVAL; SULPHUR COMPOUNDS; WATER;

CATHODES; CHEMICAL REACTORS; ELECTRIC CURRENTS; ELECTRIC DISCHARGES; ELECTRIC FIELD EFFECTS; ELECTRONS; GAS CHROMATOGRAPHY; NITROGEN; OXYGEN; SULFUR COMPOUNDS; VAPORS;

CORONA DISCHARGE; DEPOSITION TYPE REACTOR; ELECTRON ATTACHMENT; ELECTRON ENERGY; OPTIMUM OXYGEN CONCENTRATION; REMOVAL MECHANISM; WATER VAPOR;

REMOVAL;

EID: 0030131333     PISSN: 00011541     EISSN: None     Source Type: Journal    
DOI: 10.1002/aic.690420529     Document Type: Article

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