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Volumn 5037 II, Issue , 2003, Pages 917-924
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Supercritical resist dry technique for electron-beam projection lithography (EPL)
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Author keywords
EPL lithography; Lithography; Pattern collapse; Resist pattern collapse; SCCO2; Supercritical; Supercritical dry; Supercritical resist dry
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Indexed keywords
ASPECT RATIO;
CARBON DIOXIDE;
ELECTRON BEAMS;
GEOMETRY;
IMAGE PROCESSING;
PHOTOLITHOGRAPHY;
SUPERCRITICAL FLUIDS;
THICKNESS MEASUREMENT;
ELECTRON BEAM PROJECTION LITHOGRAPHY;
PATTERN COLLAPSE;
SUPERCRITICAL CARBON DIOXIDE;
SUPERCRITICAL RESIST DRY TECHNIQUE;
PHOTORESISTS;
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EID: 0141835945
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.484990 Document Type: Conference Paper |
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Times cited : (8)
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References (4)
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