An investigation of model OPC optimization based on CD uniformity yield

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5038 II, Issue , 2003, Pages 810-816

  Roy, Sabita ^a   Chen, J Fung ^a   Liebchen, Armin ^a   Laidig, Tom ^a   Wampler, Kurt ^a   Hollerbach, Uwe ^a  

^a ASML US Inc   (United States)

Author keywords

CDU; Critical dimension uniformity; OPC; Optical proximity correction; Optical proximity effect

Indexed keywords

LIGHT INTERFERENCE; MASKS; MONTE CARLO METHODS; OPTIMIZATION; PROCESS CONTROL; USER INTERFACES;

CRITICAL DIMENSION UNIFORMITY; OPTICAL PROXIMITY CORRECTION;

LITHOGRAPHY;

EID: 0141723612     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.482746     Document Type: Conference Paper

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