Outlier rejection with mixture models in alignment

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5040 III, Issue , 2003, Pages 1729-1741

  Nakajima, Shinichi ^a   Kanaya, Yuho ^a   Li, Mengling ^a   Sugihara, Taro ^a   Sukegawa, Ayako ^a   Magome, Nobutaka ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

Alignment; Information criterion; Likelihood ratio test; Maximum penalized likelihood; Mixture models

Indexed keywords

APPLICATION SPECIFIC INTEGRATED CIRCUITS; COMPUTER SIMULATION; INTEGRATED CIRCUIT MANUFACTURE; LSI CIRCUITS; MAXIMUM LIKELIHOOD ESTIMATION; PROBABILITY;

INFORMATION CRITERION; MAXIMUM PENALIZED LIKELIHOOD; MIXTURE MODELS;

PHOTOLITHOGRAPHY;

EID: 0141721564     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485385     Document Type: Conference Paper

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