Enhanced plasma performance by ICRF boronization

Plasma Science and Technology

Volumn 4, Issue 4, 2002, Pages 1375-1382

  Wan, Bao Nian ^a   Zhao, Yan Pin ^a   Li, Jian Gang ^a   Song, Mei ^a   Wu, Zhen Wei ^a   Luo, Jia Rong ^a   Li, Cheng Fu ^a   Wang, Xiao Ming ^a  

^a INSTITUTE OF PLASMA PHYSICS   (China)

Author keywords

Boronization; ICRF; Plasma performance

Indexed keywords

EID: 0141692698     PISSN: 10090630     EISSN: None     Source Type: Journal    
DOI: 10.1088/1009-0630/4/4/006     Document Type: Article

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