Properties and the influences on plasma performance for the film produced by radio frequency boronization

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 6, 2000, Pages 2835-2842

  Li, J ^a   Zhao, Y P ^a   Gong, X Z ^a   Wan, B N ^a   Gu, X M ^a   Luo, J R ^a   Zhang, S D ^a   Li, C F ^a   Fang, Y C ^a   Zhen, M ^a   Wang, X M ^a   Hu, J S ^a   Li, S F ^a   Xie, J K ^a   Wan, Y X ^a  

^a INSTITUTE OF PLASMA PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; AMORPHOUS FILMS; BORON COMPOUNDS; CHEMICAL BONDS; CYCLOTRON RESONANCE; SUPERCONDUCTING DEVICES; SUPERCONDUCTING FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

RADIO FREQUENCY BORONIZATION;

TOKAMAK DEVICES;

EID: 0034318579     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1308589     Document Type: Article

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