Mesoporous low-k hydrogen-silsesquioxane films characterized by positron annihilation and other techniques

Radiation Physics and Chemistry

Volumn 68, Issue 3-4, 2003, Pages 435-437

  Ito, Kenji ^a   Kobayashi, Yoshinori ^a   Hirata, Kouichi ^a   Togashi, Hisashi ^a   Suzuki, Ryoichi ^a   Ohdaira, Toshiyuki ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

HYDROGEN; MESOPOROUS MATERIALS; PERMITTIVITY; POROSITY; POSITRON ANNIHILATION SPECTROSCOPY;

HIGH POROSITY FILMS;

DIELECTRIC FILMS;

ALKANE DERIVATIVE; HYDROGEN;

CONFERENCE PAPER; FILM; GAMMA RADIATION; POROSITY; POSITRON; POSITRON ANNIHILATION SPECTROSCOPY; POSITRONIUM; PROBABILITY; RADIATION SCATTERING; SCANNING ELECTRON MICROSCOPY; SPECTROSCOPY;

EID: 0141627401     PISSN: 0969806X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0969-806X(03)00200-7     Document Type: Conference Paper

References (6)

1. Ito K., Nakanishi H., Ujihira Y. Extension of the equation for the annihilation lifetime of ortho-positronium at a cavity larger than. 1 nm in radius J. Phys. Chem. B. 103(21):1999;4555-4558.
2. Ito, K., et al., to be published.
3. Kobayashi Y.et al. Nanoporous structure of sputter-deposited silicon oxide films characterized by positronium annihilation spectroscopy. J. Appl. Phys. 91:2002;1704-1706.
4. Proceedings of SEMATECH Ultra Low K Workshop, Orlando FL, 1999.
5. Schultz P.J., Lynn K.G. Interaction of positron beams with surfaces, thin films, and interfaces. Rev. Mod. Phys. 60:1988;701-779.
6. Suzuki R.et al. Slow positron pulsing system for variable energy positron lifetime spectroscopy. Jpn. J. Appl. Phys. Part B Lett. 30(3B):1991;L532-L534.