Cerium oxidation during leaching of CeYSiAlO glass

Journal of Nuclear Materials

Volumn 322, Issue 2-3, 2003, Pages 111-118

  Gavarini, S ^a,b,e   Guittet, M J ^c   Trocellier, P ^d   Gautier Soyer, M ^c   Carrot, F ^a   Matzen, G ^b  

^a CNRS   (France)

^b Centre National de la Recherche Scientifique   (France)

^c Bât Paul Dirac ^*  (France)

^d DIF   (France)

^e NONE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CERIUM COMPOUNDS; INDUCTIVELY COUPLED PLASMA; LEACHING; MASS SPECTROMETRY; OXIDATION; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; X RAY SPECTROMETERS;

CHEMICAL STABILITY;

GLASS;

EID: 0141621209     PISSN: 00223115     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3115(03)00306-4     Document Type: Article

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