Evaluation of various pitches 100-nm contact holes applying IDEALSmile with high NA KrF scanner

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5040 III, Issue , 2003, Pages 1247-1257

  Ebihara, Takeaki Joe ^a   Oga, Toshihiro Tommy ^a  

^a Canon USA   (United States)

Author keywords

Contact; IDEAL; IDEALSmile; Resolution enhancement technology; VIA

Indexed keywords

COMPUTER AIDED SOFTWARE ENGINEERING; FLUORINE COMPOUNDS; MASKS; PHOTORESISTS; SCANNING; SCREEN PRINTING; SEMICONDUCTOR DEVICE MANUFACTURE; SHRINKAGE;

CONTACT HOLES; DIPOLE ILLUMINATION; FEATURE SHRINKAGE; IDEALSMILE TECHNIQUE; NEGATIVE TONE RESISTS;

PHOTOLITHOGRAPHY;

EID: 0141610139     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.485424     Document Type: Conference Paper

References (3)

1. M.D.Levenson, et al, "Vortex Mask: making 80nm contacts with a twist" Proc. SPIE 4889, p1293-1303 (2002)
2. K.Yamazoe, et al, "Challenging the limit of single mask exposure" Proc. SPIE 4691, p1601-1612 (2002)
3. K.Yamazoe, et al, "New resolution enhancement method realizing the limit of single mask exposure" Proc. SPIE 4754, p89-p98 (2002)