Negative ion beam production by a microwave ion source equipped with a magnetically separated double plasma cell system

Review of Scientific Instruments

Volumn 71, Issue 2 II, 2000, Pages 1125-1127

  Tanaka, M ^a   Amemiya, K ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0141523742     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1150404     Document Type: Article

References (16)

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