A strong narrowband peak at 13.5-nm generated in a cavity-confined tin plasma

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 II, Issue , 2003, Pages 742-749

  Aota, Tatsuya ^a   Yashiro, Hidehiko ^a   Ueno, Yoshifumi ^a   Tomie, Toshihisa ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Cavity confine; Laser produced plasma source; Nano particle target; Sn; Spectral efficiency

Indexed keywords

BANDWIDTH; LASER ABLATION; LASER PRODUCED PLASMAS; LASER PULSES; LIGHT EMISSION; NANOSTRUCTURED MATERIALS; RADIATION; TIN COMPOUNDS;

CONCAVE STRUCTURE; GRAZING INCIDENCE; TIN DIOXIDES;

LITHOGRAPHY;

EID: 0141501256     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.482631     Document Type: Conference Paper

References (3)

1. Updated EUVL Source Requirements, 1st EUVL Symposium in Dallas 2002
2. T. Tomie, Japanese Pat.2897005, US patent 6,275,565
3. M.A. Klosner and W.T. Silfvast, Opt. Lett. 23 (1998) 1609