Wall effects on the chemistry in a pulsed oxygen/silane radiofrequency helicon plasma

Journal of Physics D: Applied Physics

Volumn 36, Issue 17, 2003, Pages 2076-2082

  Charles, C ^a  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; CHEMICAL REACTORS; CRYSTAL GROWTH; DIFFUSION; ELECTRIC BREAKDOWN; FREQUENCIES; ION BOMBARDMENT; LASER PULSES; OXYGEN; POSITIVE IONS; SILANES;

HELICON DIFFUSION REACTORS; PHYSICAL SPUTTERING THRESHOLD; RADIOFREQUENCY HELICON PLASMA; WALL EFFECTS;

PLASMAS;

EID: 0141495971     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/36/17/309     Document Type: Article

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